Triple-chamber electron beam evaporation device
Easy maintenance and workability! The lift-off film formation mechanism employs a special heat insulation mechanism!
This product is an electron beam evaporation device capable of lift-off film formation, targeting metallic materials. The triple EB gun features a sliding movement mechanism, making maintenance and operation easy. The maximum substrate size is φ3 inches, and the lift-off film formation mechanism employs a special heat shielding mechanism. 【Features】 ■ Substrate size: Maximum φ3 inches ■ Substrate heating temperature: Normal use 600℃ ■ Lift-off film formation mechanism: Special heat shielding mechanism adopted ■ Electron beam gun: Hars 3-way manual sliding movement type ■ EB gun maintenance mechanism: EB gun sliding movement mechanism *For more details, please refer to the PDF document or feel free to contact us.
- Company：ケニックス
- Price：Other
